KLA-Tencor Corporation, a leading provider of process control and yield management solutions, partners with customers around the world to develop state-of-the-art inspection and metrology technologies. These technologies serve the semiconductor, data storage, LED, and other related nanoelectronics industries. With a portfolio of industry-standard products and a team of world-class engineers and scientists, the company has created superior solutions for its customers for more than 35 years. Headquartered in Milpitas, Calif., KLA-Tencor has dedicated customer operations and service centers around the world. Additional information may be found at www.kla-tencor.com .
The Film and Scatterometry Technology (FaST) Division provides industry leading metrology solutions for worldwide semiconductor IC manufacturers. The FaST Division portfolio of metrology products includes hardware and software solutions for optical film thickness, optical critical dimension (CD), composition, and resistivity measurement systems. These products are essential for the IC manufacturers as they provide critical metrology capabilities for the development and implementation of their advanced IC processes. The FaST division is committed to support our customers to achieve performance entitlement of our solution and we effectively partner with our customers from their early research and development phase to the high volume in-line manufacturing implementation specific for their process needs. The division consists of a global team located in US, Israel, China, and India.
The Advanced Development group has a mission to propose and demonstrate future generation differentiated technologies for semiconductor device and thin film metrology. The X-ray Lead Algorithm Scientist will be responsible for algorithm development and data analysis efforts in the investigation of X-ray metrology.
The Algorithm Scientist will produce mathematical formulations, develop modeling tools, and perform data analysis and capability predictions on a variety of X-ray and optical metrology technologies. The role will closely interface with other members of Advanced Development, Engineering, and Algorithm teams. The Scientist should possess a demonstrated ability to develop complex data analysis algorithms, software codes that can be used by others, understanding of experimental data analysis, and ability to guide others.
- Expert-level systems knowledge of algorithms in X-ray analytical technologies such as X-ray diffraction (XRD), X-ray fluorescence (XRF), small-angle and wide-angle X-ray scattering (SAXS and WAXS), X-ray reflectivity (XRR), X-ray photo-electron spectroscopy (XPS)
- Expert knowledge of Matlab and C++
- Knowledge of optical metrology algorithms for critical dimensions, film thickness, and composition.
- Understanding of challenges in semiconductor metrology
- Knowledge of IP development
Doctorate (Academic) with at least 7 years of experience. OR Master's Level Degree with at least 8 years of experience. OR Bachelor's Level Degree with at least 10 years of experience.
Equal Employment Opportunity
KLA-Tencor is an Equal Opportunity Employer.
KLA-Tencor - 20 months ago
KLA-Tencor is hard-core when it comes to hunting down chip flaws. One of the world's largest makers of process control equipment for...